{"id":86741,"date":"2026-07-16T16:32:00","date_gmt":"2026-07-16T13:32:00","guid":{"rendered":"https:\/\/www.indir.com\/haber\/?p=86741"},"modified":"2026-07-16T11:36:17","modified_gmt":"2026-07-16T08:36:17","slug":"intelden-litografide-high-na-euv-devrimi","status":"publish","type":"post","link":"https:\/\/www.indir.com\/haber\/intelden-litografide-high-na-euv-devrimi\/","title":{"rendered":"Intel&#8217;den Litografide High NA EUV Devrimi"},"content":{"rendered":"\n<p class=\"wp-block-paragraph\">Yar\u0131 iletken end\u00fcstrisinde \u00f6nemli bir e\u015fik a\u015f\u0131ld\u0131. ASML&#8217;nin 15 Temmuz \u00c7ar\u015famba g\u00fcn\u00fc yapt\u0131\u011f\u0131 resmi a\u00e7\u0131klamaya g\u00f6re Intel Foundry, Hollandal\u0131 \u015firketin yeni nesil High NA EUV litografi teknolojisini kullanarak y\u00fcksek hacimli mant\u0131k \u00e7ipi \u00fcretimine ge\u00e7en ve bu \u00e7ipleri m\u00fc\u015fterilerine sevk eden sekt\u00f6rdeki ilk \u00fcretici oldu. Teknoloji, Intel 18A \u00fcretim s\u00fcrecinde geli\u015ftirilen Core Ultra Series 3 &#8220;Panther Lake&#8221; i\u015flemcilerinin belirli katmanlar\u0131n\u0131n desenlenmesinde kullan\u0131l\u0131yor.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">\u00dcretim Intel&#8217;in Oregon eyaletindeki tesislerinde y\u00fcr\u00fct\u00fcl\u00fcyor. ASML&#8217;ye g\u00f6re High NA EUV ile \u00fcretilen katmanlar, mevcut NXE EUV platformunda elde edilen verimlilik seviyelerini yakalam\u0131\u015f durumda. \u00dcstelik bu katmanlar &#8220;\u00e7ift kalifikasyon&#8221; \u00f6zelli\u011fi ta\u015f\u0131yor; yani ayn\u0131 tasar\u0131m hem 0.33 NA&#8217;l\u0131k NXE taray\u0131c\u0131larda hem de 0.55 NA&#8217;l\u0131k EXE makinelerinde pozlanabiliyor ve ortaya \u00e7\u0131kan wafer&#8217;lar birbirinin yerine kullan\u0131labiliyor.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">High NA EUV Neden \u00d6nemli?<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\">High NA EUV uzun s\u00fcredir g\u00fcn\u00fcm\u00fcz EUV litografisinin halefi olarak g\u00f6r\u00fcl\u00fcyordu; ancak bug\u00fcne kadar yaln\u0131zca Ar-Ge \u00e7al\u0131\u015fmalar\u0131yla s\u0131n\u0131rl\u0131 kalm\u0131\u015ft\u0131. ASML&#8217;nin duyurusu, teknolojinin ilk kez ticari bir \u00fcr\u00fcnde y\u00fcksek hacimli \u00fcretim i\u00e7in kullan\u0131ld\u0131\u011f\u0131n\u0131 g\u00f6steriyor.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">Sistem mevcut taray\u0131c\u0131larla ayn\u0131 13,5 nanometre dalga boyundaki \u0131\u015f\u0131\u011f\u0131 kullan\u0131yor; fark, optik sistemin say\u0131sal a\u00e7\u0131kl\u0131k (NA) de\u011ferinin 0.33&#8217;ten 0.55&#8217;e y\u00fckseltilmesinde yat\u0131yor. Bu art\u0131\u015f, tek pozlamada \u00e7ok daha k\u00fc\u00e7\u00fck ve yo\u011fun devre desenlerinin olu\u015fturulmas\u0131na imkan tan\u0131yor. Y\u00fckselen \u00e7\u00f6z\u00fcn\u00fcrl\u00fc\u011f\u00fcn, end\u00fcstrinin en zorlu katmanlar\u0131nda karma\u015f\u0131k \u00e7oklu desenleme (multi-patterning) tekniklerine olan ihtiyac\u0131 azaltarak \u00fcretimi sadele\u015ftirmesi ve desen do\u011frulu\u011funu art\u0131rmas\u0131 bekleniyor. Uzun vadede ise \u00f6zellikle yapay zeka i\u015f y\u00fcklerinin geli\u015fmi\u015f \u00e7ip talebini art\u0131rd\u0131\u011f\u0131 bir d\u00f6nemde, daha y\u00fcksek transist\u00f6r yo\u011funlu\u011fu ve daha g\u00fc\u00e7l\u00fc i\u015flemcilerin \u00f6n\u00fcn\u00fc a\u00e7mas\u0131 \u00f6ng\u00f6r\u00fcl\u00fcyor.<\/p>\n\n\n\n<figure class=\"wp-block-image size-full\"><img loading=\"lazy\" decoding=\"async\" width=\"1250\" height=\"750\" src=\"http:\/\/www.indir.com\/haber\/wp-content\/uploads\/2026\/07\/asml-lithography-machine-semiconductor-manufacturing-cleanroom.webp\" alt=\"asml fabrika\" class=\"wp-image-86746\" title=\"\"><\/figure>\n\n\n\n<p class=\"wp-block-paragraph\">\u00d6te yandan bu maliyetli bir hamle: Her bir High NA sistemi yakla\u015f\u0131k 400 milyon dolara mal oluyor ve standart EUV makinelerinin iki kat\u0131 fiyata sat\u0131l\u0131yor.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">Panther Lake Tamamen Bu Teknolojiyle \u00dcretilmiyor<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\">\u00d6nemli bir ayr\u0131nt\u0131 olarak, Panther Lake \u00e7iplerinin tamam\u0131 yeni platformla \u00fcretilmiyor. Intel, High NA EUV&#8217;yi yaln\u0131zca se\u00e7ili katmanlar i\u00e7in kalifiye etti; \u00e7ipin geri kalan\u0131 geleneksel litografi y\u00f6ntemleriyle \u00fcretilmeye devam ediyor. Bu yakla\u015f\u0131m, yeni litografi nesillerinin ileri d\u00fczey \u00fcretime tipik olarak nas\u0131l kademeli girdi\u011fini yans\u0131t\u0131yor.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">Panther Lake&#8217;in kendisi de gelecekte \u00e7\u0131kacak bir \u00fcr\u00fcn de\u011fil. Intel, Core Ultra Series 3&#8217;\u00fc 5 Ocak 2026&#8217;da CES&#8217;te tan\u0131tm\u0131\u015f ve sistemler 27 Ocak&#8217;tan itibaren k\u00fcresel olarak raflara \u00e7\u0131km\u0131\u015ft\u0131. Duyurudaki &#8220;m\u00fc\u015fterilere sevkiyat&#8221; ifadesi, bir \u00fcr\u00fcn lansman\u0131n\u0131 de\u011fil, fabrikadan tedarik zincirine y\u00f6nelik wafer ak\u0131\u015f\u0131n\u0131 ifade ediyor.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">\u0130ki \u015eirketin Y\u0131llara Yay\u0131lan \u0130\u015f Birli\u011fi<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\">Intel ve ASML bu kilometre ta\u015f\u0131 i\u00e7in y\u0131llard\u0131r birlikte \u00e7al\u0131\u015f\u0131yor. Intel, 2024&#8217;te sekt\u00f6r\u00fcn ilk ticari High NA sistemlerinden biri olan TWINSCAN EXE:5000&#8217;i Hillsboro, Oregon&#8217;daki Ar-Ge tesisine kurmu\u015ftu. \u015eirket daha sonra, wafer \u00e7\u0131kt\u0131s\u0131n\u0131 ve hizalama do\u011frulu\u011funu art\u0131ran, geli\u015ftirilmi\u015f \u0131\u015f\u0131k kayna\u011f\u0131na sahip ikinci nesil TWINSCAN EXE:5200B&#8217;yi kalifiye eden ilk \u00fcretici de olmu\u015ftu.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">ASML Ba\u015fkan\u0131 ve CEO&#8217;su Christophe Fouquet, artan \u00e7\u00f6z\u00fcn\u00fcrl\u00fck ve daha iyi s\u00fcre\u00e7 kontrol\u00fcyle High NA EUV&#8217;nin yar\u0131 iletken litografisinde \u00f6nemli bir geli\u015fme oldu\u011funu belirterek, daha k\u00fc\u00e7\u00fck ve yo\u011fun desenlemenin yapay zeka gibi y\u00fckselen teknolojilerdeki ilerlemeleri h\u0131zland\u0131raca\u011f\u0131n\u0131 ve bu s\u00fcre\u00e7te rol almaktan gurur duyduklar\u0131n\u0131 ifade etti.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">Intel Foundry \u0130cra Ba\u015fkan Yard\u0131mc\u0131s\u0131 ve Genel M\u00fcd\u00fcr\u00fc Naga Chandrasekaran ise se\u00e7ili Intel 18A katmanlar\u0131nda High NA s\u00fcrecinin kalifiye edilmesinin, mevcut makine filosunun m\u00fc\u015fterilere daha y\u00fcksek \u00fcretim \u00e7\u0131kt\u0131s\u0131 sunmas\u0131n\u0131 sa\u011flad\u0131\u011f\u0131n\u0131 ve gelecekteki \u00fcretim teknolojileri i\u00e7in esneklik yaratt\u0131\u011f\u0131n\u0131 s\u00f6yledi.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">\u0130ki \u015firket High NA haz\u0131rl\u0131klar\u0131na devam edecek. Teknolojinin bir sonraki adresi ise \u015fimdiden belli: Intel, yeni nesil 14A \u00fcretim s\u00fcrecini, en dar aral\u0131kl\u0131 katmanlar\u0131nda High NA kullanacak \u015fekilde tasarlad\u0131.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Yar\u0131 iletken end\u00fcstrisinde \u00f6nemli bir e\u015fik a\u015f\u0131ld\u0131. ASML&#8217;nin 15 Temmuz \u00c7ar\u015famba g\u00fcn\u00fc yapt\u0131\u011f\u0131 resmi a\u00e7\u0131klamaya g\u00f6re Intel Foundry, Hollandal\u0131 \u015firketin yeni nesil High NA EUV litografi teknolojisini kullanarak y\u00fcksek hacimli mant\u0131k \u00e7ipi \u00fcretimine ge\u00e7en ve bu \u00e7ipleri m\u00fc\u015fterilerine sevk eden sekt\u00f6rdeki ilk \u00fcretici oldu. Teknoloji, Intel 18A \u00fcretim s\u00fcrecinde geli\u015ftirilen Core Ultra Series 3 &#8220;Panther [&hellip;]<\/p>\n","protected":false},"author":72,"featured_media":86745,"comment_status":"open","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[1],"tags":[],"class_list":["post-86741","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-teknoloji"],"_links":{"self":[{"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/posts\/86741","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/users\/72"}],"replies":[{"embeddable":true,"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/comments?post=86741"}],"version-history":[{"count":1,"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/posts\/86741\/revisions"}],"predecessor-version":[{"id":86747,"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/posts\/86741\/revisions\/86747"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/media\/86745"}],"wp:attachment":[{"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/media?parent=86741"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/categories?post=86741"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.indir.com\/haber\/wp-json\/wp\/v2\/tags?post=86741"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}